Acid-breakable-resin-based chemical amplification positive resist for 0.1-μm-rule reticle fabrication: design and lithographic performance
- 著者名:
Migitaka,S. ( Hitachi, Ltd. ) Arai,T. Sakamizu,T. Kasuya,K. Hashimoto,M. Shiraishi,H. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 341
- 終了ページ:
- 350
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
7
国際会議録
Water-Soluble Onium Salts: New Class of Acid Generators for Chemical Amplification Positive Resists
American Chemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Performance of a chemically amplified positive resist for next-generation photomask fabrication
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
10
国際会議録
Performance of positive-tone chemically amplified resists for next-generation photomask fabrication
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |