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Application of chemically amplified resist to 10-keV e-beam system

著者名:
Ahn,S. ( Samsung Electronics Co., Ltd. )
Kim,C.
Yang,S.-H.
Moon,S.-Y.
Choi,S.-W.
Han,W.-S.
Sohn,J.-M.
さらに 2 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology VIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4409
発行年:
2001
開始ページ:
324
終了ページ:
330
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
言語:
英語
請求記号:
P63600/4409
資料種別:
国際会議録

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1 国際会議録 Application of e-beam chemically amplified resist to devices below 0.18-μm node

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