RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
- 著者名:
Hsu,S. ( ASML MaskTools, Inc. ) Shi,X. Hsu,M. Corcoran,N.P. Chen,J.F. Desai,S. Sherrill,M.J. Tseng,Y.C. Chang,H.A. Kao,J.F. Tseng,A. Liu,W.J. Chen,A. Lin,A. Kujten,J.P. Jacobs,E. Verhappen,A. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 172
- 終了ページ:
- 185
- 総ページ数:
- 14
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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