Resolution enhancement techniques in optical lithography: It's not just a mask problem
- 著者名:
- Liebmann,L.W. ( IBM Microelectronics )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 23
- 終了ページ:
- 32
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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