Characterization and optimization of deep dry etching for MEMS applications

Characterization and optimization of deep dry etching for MEMS applications

著者名:

Rickard,A. ( Defence Evaluation and Research Agency Malvern )
McNie,M.E.

掲載資料名:

MEMS design, fabrication, characterization, and packaging : 30 May-1 June 2001, Edinburgh, UK

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4407

発行年:

2001

開始ページ:

78

終了ページ:

88

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441089 [0819441082]

言語:

英語

請求記号:

P63600/4407

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012123
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : MEMS Design, Fabrication, Characterization, and Packaging
回次:	2001
会議開催地:	Edinburgh, UK
会議開催年:	2001.05.30-2001.06.01

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