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Process-induced threshold voltage fluctuations on SOI fully depleted technology

著者名:
掲載資料名:
In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4406
発行年:
2001
開始ページ:
171
終了ページ:
179
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441072 [0819441074]
言語:
英語
請求記号:
P63600/4406
資料種別:
国際会議録

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