Blank Cover Image

Mechanism and annihilation of shallow-trench-isolation-enhanced poly-mask-edge N+/P-well junction leakage

著者名:
Doong,K.Y.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. )
Lin,S.
Hsieh,S.
Shen,B.
Yang,Y.-H.
Chen,P.
Hsu,C.C.-H.
さらに 2 件
掲載資料名:
In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4406
発行年:
2001
開始ページ:
49
終了ページ:
56
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441072 [0819441074]
言語:
英語
請求記号:
P63600/4406
資料種別:
国際会議録

類似資料:

1 国際会議録 Defect detection for short-loop process and SRAM-cell optimization by using addressable failure site-test structures(AFS-TS)

Doong, K.Y.-Y., Hsieh, S., Lin, S.C., Wang, J.R., Shen, B., Hung, L.J., Guo, J.C., Chen, I.C., Young, K.L., Hsu, C.C.-H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Optimization of the Active Area Edge Protection in Shallow Trench Isolation

Augendre, E., Rooyackers, R., Pochet, S., Grau, L., Sleeckx, F., Vandamme, E.P., Badenes, G.

Electrochemical Society
2 国際会議録 Impact of active dimension on junction leakages of a Ti-salicide process integrated with shallow-trench isolation

Siah,S.-Y., Lim,E.H., Shiu,M.-J., Lee,K.H., Zheng,J.Z.

SPIE - The International Society for Optical Engineering
8 国際会議録 Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes [6152-05]

Hsu, J. W., Shieh, J. H., Doong, K. Y. Y., Hung, L. J., Lin, S. C., Ting, C. Y., Jang, S. M., Young, K. L., Liang, M. S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Optimum conditions for high-fidelity holographic storage in photorefractive crystals

S.H. Lin, P. Yeh, M.L. Hsieh, K.Y. Hsu, T.-C. Hsieh

Society of Photo-optical Instrumentation Engineers
9 国際会議録 Controllable enhancement of spontaneous emission in perpendicular direction by single quantum well embedded in planar microcavities

Zhao,H., Shen,G., Yin,T., Chen,C., Xu,Z., Lian,P., Gao,G., Lin,S.

SPIE-The International Society for Optical Engineering
4 国際会議録 Stress-induced leakage currents of CMOS ULSI devices with shallow trench isolation

Sundaresan,R., Gan,C.H., Peidous,I.V.

SPIE - The International Society for Optical Engineering
10 国際会議録 Quinone-based-molecule-doped poly(methyl methacrylate) photopolymer for holographic data storage (Invited Paper)

Lin, S.-H., Hsu, K.Y.

SPIE-The International Society for Optical Engineering
5 国際会議録 Quantum dot formation with silicon doping in InGaN/GaN quantum well structures and its implications in radiative mechanisms

Cheng, Y.-C., Tseng, C.-H., Hsu, C., Ma, K.-J., Feng, S.-W., Lin, E.-C., Yang, C.C., Chyi, J.-I.

SPIE-The International Society for Optical Engineering
11 国際会議録 Real-time image processing using photorefractive crystals

K.Y. Hsu, S.H. Lin, T.C. Hsieh

Society of Photo-optical Instrumentation Engineers
6 国際会議録 "Mask defect disposition: flux-area measurement of edge, contact, and OPC defects correlates to wafer and enables effective decisions"

Fiekowsky,P., Taylor,D., Wang,D., Yang,C.C., Lin,S.C., Tu,L.H., Lin,K.R.

SPIE-The International Society for Optical Engineering
12 国際会議録 Improvement of Single-junction a-Si:H Thin-film Solar Cells Toward 10% Efficiency

P.H. Cheng, S.W. Liang, Y.P. Lin, H.J. Hsu, C.H. Hsu, C.C. Tsai

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12