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Sub-0.35-μm i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications

著者名:
掲載資料名:
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4404
発行年:
2001
開始ページ:
354
終了ページ:
367
総ページ数:
14
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441058 [0819441058]
言語:
英語
請求記号:
P63600/4404
資料種別:
国際会議録

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