Application of e-beam chemically amplified resist to devices below 0.18-μm node
- 著者名:
- Jeon,C.-U. ( Samsung Electronics Co., Ltd. )
- Kim,C.-H.
- Choi,S.-W.
- Han,W.-S.
- Sohn,J.-M.
- 掲載資料名:
- 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4349
- 発行年:
- 2000
- 開始ページ:
- 160
- 終了ページ:
- 163
- 総ページ数:
- 4
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440396 [0819440396]
- 言語:
- 英語
- 請求記号:
- P63600/4349
- 資料種別:
- 国際会議録
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