Linewidth asymmetry study to predict aberration in lithographic lenses
- 著者名:
- Kye,J. ( Advanced Micro Devices, Inc. )
- Dusa,M.V.
- Levinson,H.J.
- 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- Two of Two Parts
- 開始ページ:
- 1280
- 終了ページ:
- 1289
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Study of mask aerial images to predict CD proximity and line end shortening of resist patterns
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |