Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography
- 著者名:
Kakizaki,K. ( Gigaphoton, Inc. ) Matsunaga,T. Sasaki,Y. Inoue,T. Tanaka,S. Tada,A. Taniguchi,H. Arai,M. Igarashi,T. - 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- Two of Two Parts
- 開始ページ:
- 1210
- 終了ページ:
- 1218
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
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4
国際会議録
Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography
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