Carbon antireflective coating (ARC) technology for both KrF and ArF lithography

Carbon antireflective coating (ARC) technology for both KrF and ArF lithography

著者名:

Kim,Y. ( Samsung Electronics Co., Ltd. )
Lee,J.
Cho,H.
Moon,J.T.

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

Two of Two Parts

開始ページ:

994

終了ページ:

1002

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF Park,J., Yeo,G., Kim,I., Kim,B.-S., Lee,J., Cho,H., Moon,J.T. SPIE-The International Society for Optical Engineering	7 国際会議録 Development of bottom antireflective coating for high-resolution KrF lithography Kang, Y.-H., Oh, C.-I.., Song, S.-K., Kim, D.-B., Kim, J.-H. SPIE-The International Society for Optical Engineering
2 国際会議録 Anthracene-organosiloxane spin-on antireflective coating for KrF lithography Kennedy, J.T., Baldwin-Hendricks, T., Hebert, M., Suedmeyer, A. SPIE-The International Society for Optical Engineering	8 国際会議録 Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
3 国際会議録 Feasibility of very low k1(=0.31) KrF lithography Kim,I.-S., Kim,B.-S., Lee,J.-H., Cho,H.-K., Moon,J.-T. SPIE-The International Society for Optical Engineering	9 国際会議録 Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T. SPIE-The International Society for Optical Engineering
4 国際会議録 Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography Kim, S.-H., Lee, S.-H., Yeo, G.-S., Lee, J.H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering	10 国際会議録 ArF excimer laser lithography with bottom antireflective coating Kishimura,S., Takahashi,M., Nakazawa,K., Ohfuji,T., Sasago,M., Uematsu,M., Ogawa,T., Ohtsuka,H. SPIE-The International Society for Optical Engineering
5 国際会議録 Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists Hong,S.-E., Jung,M.-H., Jung,J.-C., Lee,G., Kim,J.-S., Koh,C.-W., Baik,K.-H. SPIE - The International Society for Optical Engineering	11 国際会議録 Nonshrinkable photoresists for ArF lithography Kim, J.-B., Oh, T.H., Choi, J.-H., Lee, J.-J. SPIE-The International Society for Optical Engineering
6 国際会議録 What an antishrinkage coating method can surmount among stumbling block of ArF resists Kim, H.-D., Lee, S.-H., Choi, S.-J., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering	12 国際会議録 Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74] Jung, J C, Lee, S K, Ban, K D, Bok C, Kim H S, Moon, S C, Kim, J SPIE - The International Society of Optical Engineering

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