Mask error enhancement factor for sub-0.13-μm lithography

Mask error enhancement factor for sub-0.13-μm lithography

著者名:

Tan,S.K. ( National Univ. of Singapore )
Lin,Q.
Quan,C.
Tay,C.J.
See,A.

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

Two of Two Parts

開始ページ:

879

終了ページ:

887

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Characterization of assist features on impact of mask error enhancement factors for sub-0.13-um technology Tan,S.K., Lin,Q., Tay,C.J., Quan,C. SPIE-The International Society for Optical Engineering	7 国際会議録 The study of chromeless phase lithography (CPL) for 45nm lithography [6349-98] Tan, S. Y., Lin, Q., Tay, C. J., Quan, C. SPIE - The International Society of Optical Engineering
2 国際会議録 MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J. SPIE-The International Society for Optical Engineering	8 国際会議録 Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths Wang,Y.-Y., Lin,H.-T., Yu,S.-S., Chen,C.-K., Ku,Y.-C., Yen,A., Lin,B.J. SPIE-The International Society for Optical Engineering
3 国際会議録 Impact of transmission error for attenuated phase-shift mask for 0.10-μm technology Tan, S.K., Lin, Q., Quan, C., Tay, C.J. SPIE-The International Society for Optical Engineering	9 国際会議録 Advance KrF chemical amplified photoresists for 0.13-μm lithography Lin,Q., Sack,M.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Sub-0.10-μm lithography technology with resolution enhancement technique Chua, G.S., Lin, Q., Tay, C.J., Quan, C. SPIE-The International Society for Optical Engineering	10 国際会議録 Lithography challenges of dual-damascence process in 0.13-μm era Chen,L.-J., Shiu,L.-H., Tsai,C.-S., Chang,C.-H., Kang,T.-K., Chou,S.-Y. SPIE-The International Society for Optical Engineering
5 国際会議録 Process window optimization of CPL mask for beyond 45nm lithography S. Y. Tan, Q. Lin, C. J. Tay, C. Quan SPIE - The International Society of Optical Engineering	11 国際会議録 Printing 0.13-μm contact holes using 193-nm attenuated phase-shifting masks Wang,C.-M.A., Lin,S.-J., Lin,C.-H., Ku,Y.-C., Yen,A. SPIE-The International Society for Optical Engineering
6 国際会議録 Application of attenuated phase-shifting masks to sub-130-nm lithography Koo,C.-K., Choo,L.-C., Lin,Q., Tan,S.-S., Lee,H.-J., Tam,S.-C., See,A. SPIE-The International Society for Optical Engineering	12 国際会議録 Dipole options for 90-nm lithography technologies and below Chua, G.S., Tay, C.J., Quan, C., Lin, Q., Chua, L.-H. SPIE-The International Society for Optical Engineering

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