Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography

著者名:

Koo,S.-S. ( Hyundai Electronics Industries Co., Ltd. )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

770

終了ページ:

777

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	7 国際会議録 Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S. SPIE-The International Society for Optical Engineering
2 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering	8 国際会議録 Feasibility study of printing sub-100-nm with ArF lithography Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 Validation of repair process for DUV attenuated phase-shift mask Paek,S.W., Kim,H.-B., Ahn,C.-N., Koo,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering	9 国際会議録 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering
4 国際会議録 Quantitative analysis of mask error effect on wafer CD variation in ArF lithography Kim,S.-J., Koo,S.-S., Kim,S.-M., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	10 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
5 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H. SPIE-The International Society for Optical Engineering	11 国際会議録 Application of attenuated phase-shifting masks to sub-130-nm lithography Koo,C.-K., Choo,L.-C., Lin,Q., Tan,S.-S., Lee,H.-J., Tam,S.-C., See,A. SPIE-The International Society for Optical Engineering
6 国際会議録 Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography Nam,K.-H., Kim,L.-J., Jeong,H.-S., Lee,S.-W., Lee,I.-S., Shin,C., Kim,H.-S., Dieu,L., Paek,S.W., Koo,S.-S., Bae,S.-M., … SPIE-The International Society for Optical Engineering	12 国際会議録 Mask critical dimension error on optical lithography Eom,T.-S., Koo,S.-S., Paek,S.-W., Kim,H.-B., Ahn,C.-N., Baik,K.-H. SPIE - The International Society for Optical Engineering

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