"Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification"

"Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification"

著者名:

Semmler,A. ( Infineon Technologies )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

744

終了ページ:

754

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

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2 国際会議録 Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification Griesinger,U.A., Mader,L., Semmler,A., Dettmann,W., Noelscher,C., Pforr,R. SPIE-The International Society for Optical Engineering	8 国際会議録 Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
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