Optimum mask and source patterns to print a given shape
- 著者名:
Rosenbluth,A.E. ( IBM Thomas J. Watson Research Ctr. ) Bukofsky,S.J. Hibbs,M.S. Lai,K. Molless,A.F. Singh,R.N. Wong,A.K. - 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- One of Two Parts
- 開始ページ:
- 486
- 終了ページ:
- 502
- 総ページ数:
- 17
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
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