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"Mutually optimizing resolution enhancement techniques: illumination, APSM, assist feature OPC, and gray bars"

著者名:
Smith,B.W. ( Rochester Institute of Technology )  
掲載資料名:
Optical Microlithography XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4346
発行年:
2001
巻:
4346
パート:
One of Two Parts
開始ページ:
471
終了ページ:
485
総ページ数:
15
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
言語:
英語
請求記号:
P63600/4346
資料種別:
国際会議録

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2 国際会議録 Spatial filtering effects of the attenuated PSM and assist bar OPC

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8 国際会議録 Revalidation of the Rayleigh resolution and DOF limits

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3 国際会議録 OPC and image optimization using localized frequency analysis

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9 国際会議録 Model-based OPC for sub-resolution assist feature enhanced layouts

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10 国際会議録 AF fixer: new incremental OPC method for optimizing assist feature

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5 国際会議録 OPC reticle inspection techniques

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11 国際会議録 Illumination pupil filtering using modified quadrupole apertures

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6 国際会議録 Design and development of thin film materials for 157-nm and VUV wavelengths:APSM,binary masking,and optical coatings applications

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