Patterning 80-nm gates using 248-nm lithography: an approach for 0.13-μm VLSI manufacturing

Patterning 80-nm gates using 248-nm lithography: an approach for 0.13-μm VLSI manufacturing

著者名:

Wang,C.-M. ( United Microelectronics Corp. )
Lai,C.-W.
Huang,J.
Liu,H.-Y.

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

452

終了ページ:

463

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

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