Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks

Application of 3D EMF simulation for development and optimization of alternating phase-shifting masks

著者名:

Semmler,A. ( Infineon Technologies )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

356

終了ページ:

367

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 "Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification" Semmler,A., Elsner,A., Koehle,R., Mader,L., Pforr,R., Noelscher,C., Friedrich,C.M., Knobloch,J., Griesinger,U.A. SPIE-The International Society for Optical Engineering	7 国際会議録 Transmission and phase balancing of alternating phase-shifting masks(5X):theoretical and experimental results Griesinger,U.A., Pforr,R., Knobloch,J., Friedrich,C. SPIE - The International Society for Optical Engineering
2 国際会議録 Balancing of alternating phase-shifting masks for practical application: modeling and experimental verification Griesinger,U.A., Mader,L., Semmler,A., Dettmann,W., Noelscher,C., Pforr,R. SPIE-The International Society for Optical Engineering	8 国際会議録 Image performance and mask characterization of 157-nm alternating phase-shifting mask Chen, Y.-T., Meute, J., Dean, K.R., Stark, D.R., Schilz, C.M., Dettmann, W., Koehle, R., Schiessl, B., Degel, W. SPIE-The International Society for Optical Engineering
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4 国際会議録 Evaluating the potential of alternating phase-shift masks using lithography simulation Friedrich,C., Ergenzinger,K., Gans,F., Crassmann,A., Griesinger,U.A., Knobloch,J., Mader,L., Maurer,W., Pforr,R. SPIE - The International Society for Optical Engineering	10 国際会議録 Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm Zurbrick,L.S., Emery,D., Rudzinski,M.W., Wihl,M.J., Prudhomme,M., Crell,C., Griesinger,U.A., Vorwerk,M., Hennig,M. SPIE-The International Society for Optical Engineering
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