100-nm node lithography with KrF?
- 著者名:
Ferri,J.E. ( MIT Lincoln Lab. ) Tyrrell,B. Astolfi,D.K. Yost,D. Davis,P. Wheeler,B. Mallen,R. Jarmolowicz,J. Cann,S.G. Liu,H.Y. Ma,M. Chan,D.Y. Rhyins,P.D. Carney,C. Blachowicz,B.A. - 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- One of Two Parts
- 開始ページ:
- 191
- 終了ページ:
- 204
- 総ページ数:
- 14
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |