Investigation of attenuated phase-shifting mask material for 157-nm lithography

Investigation of attenuated phase-shifting mask material for 157-nm lithography

著者名:

Onodera,T. ( Semiconductor Leading Edge Technologies, Inc. )
Matsuo,T.
Itani,T.
Morimoto,H.

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

61

終了ページ:

71

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering	7 国際会議録 Requirements for reticle and reticle material for 157-nm lithography: requirements for hard pellicle Miyazaki,J., Itani,T., Morimoto,H. SPIE-The International Society for Optical Engineering
2 国際会議録 CrOxFy as a material for attenuated phase-shift masks in ArF lithography Nakazawa,K., Matsuo,T., Onodera,T., Morimoto,H., Mohri,H., Hatsuta,C., Hayashi,N. SPIE - The International Society for Optical Engineering	8 国際会議録 Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering
3 国際会議録 ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography Onodera,T., Matsuo,T., Nakazawa,K., Miyazaki,J., Ogawa,T., Morimoto,H., Haraguchi,T., Fukuhara,N., Otaki,M., Takeuchi,S. SPIE - The International Society for Optical Engineering	9 国際会議録 Feasibility study of an embedded transparent phase-shifting mask in ArF lithography Matsuo,T., Ogawa,T., Morimoto,H. SPIE - The International Society for Optical Engineering
4 国際会議録 Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography Kurose, E., Watanabe, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	10 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
5 国際会議録 Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 Selete activity of 157-nm lithography and masks Yoshioka, N., Itani, T., Wakamiya, W. SPIE-The International Society for Optical Engineering
6 国際会議録 Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	12 国際会議録 157-nm attenuated phase-shift mask materials with irradiation stability Wasson, J.R., Edwards, N.V., Lu, B., Mangat, P., Grenville, A. SPIE - The International Society of Optical Engineering

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