Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

著者名:

Ryoo,M. ( Association of Super-Advanced Electronics Technologies )

掲載資料名:

Advances in Resist Technology and Processing XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4345

発行年:

2001

巻:

4345

パート:

Two of Two Parts

開始ページ:

903

終了ページ:

911

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440310 [0819440310]

言語:

英語

請求記号:

P63600/4345

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012061
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2001 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.02.28

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