"Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process"
- 著者名:
Koh,C.-W. ( Hyundai Electronics Industries Co., Ltd. ) Jung,J.-C. Kim,M.-S. Kong,K.-K. Lee,G. Jung,M.-H. Kim,J.-S. Shin,K.-S. - 掲載資料名:
- Advances in Resist Technology and Processing XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4345
- 発行年:
- 2001
- 巻:
- 4345
- パート:
- Two of Two Parts
- 開始ページ:
- 798
- 終了ページ:
- 803
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- 言語:
- 英語
- 請求記号:
- P63600/4345
- 資料種別:
- 国際会議録
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2
国際会議録
Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers
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4
国際会議録
Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
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