Integration of ultrathin resist processes into MPU IC manufacturing flows
- 著者名:
Cobb,J.L. ( Motorola ) Conley,W. Guenther,T. Huang,F. Lee,J.J. Lii,T. Dakshina-Murthy,S. Parker,C. Usmani,S. Wu,W. Hector,S.D. - 掲載資料名:
- Advances in Resist Technology and Processing XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4345
- 発行年:
- 2001
- 巻:
- 4345
- パート:
- One of Two Parts
- 開始ページ:
- 261
- 終了ページ:
- 272
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- 言語:
- 英語
- 請求記号:
- P63600/4345
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |