Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement
- 著者名:
- Wu,C.-H.J. ( IBM Semiconductor Research and Development Ctr. )
- Huang,W.-S.
- Chen,K.-J.R.
- Archie,C.N.
- Lagus,M.E.
- 掲載資料名:
- Advances in Resist Technology and Processing XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4345
- 発行年:
- 2001
- 巻:
- 4345
- パート:
- One of Two Parts
- 開始ページ:
- 190
- 終了ページ:
- 199
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- 言語:
- 英語
- 請求記号:
- P63600/4345
- 資料種別:
- 国際会議録
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