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Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

著者名:
Tanaka,T. ( Samsung Electronics Co., Ltd. )
Choi,S.-J.
Jung,D.-W.
Lee,S.
Lee,S.-H.
Kang,Y.
Woo,S.-G.
Moon,J.-T.
Kavanagh,R.J.
Barclay,G.G.
Orsula,G.W.
Mattia,J.
Caporale,S.
Adams,T.G.
Kang,D.
さらに 10 件
掲載資料名:
Advances in Resist Technology and Processing XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4345
発行年:
2001
巻:
4345
パート:
One of Two Parts
開始ページ:
119
終了ページ:
130
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
言語:
英語
請求記号:
P63600/4345
資料種別:
国際会議録

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