"IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" | 東京工業大学附属図書館文献データベース

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"IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"

著者名:

Kwong,R.W. ( IBM Microelectronics )

Mahorowala,A.P.

Sooriyakumaran,R.

Fenzel-Alexander,D.

さらに 8 件

掲載資料名:

Advances in Resist Technology and Processing XVIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4345

発行年:

2001

巻:

4345

パート:

One of Two Parts

開始ページ:

50

終了ページ:

57

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440310 [0819440310]

言語:

英語

請求記号:

P63600/4345

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012061
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2001 : 18th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.02.28

類似資料:

1 国際会議録 Evolution of a 193-nm bilayer resist for manufacturing Kwong, R.W., Khojasteh, M., Lawson, P., Hughes, T., Varanasi, P.R., Brunsvold, B., Allen, R.D., Brock, P.J., … SPIE-The International Society for Optical Engineering	7 国際会議録 "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform … Kajita,T., Nishimura,Y., Yamamoto,M., Ishii,H., Soyano,A., Kataoka,A., Slezak,M., Shimizu,M., Varanasi,P.R., … SPIE-The International Society for Optical Engineering
2 国際会議録 Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering	8 国際会議録 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering
3 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering	9 国際会議録 Positive bilayer resists for 248-and 193-nm lithography Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., … SPIE-The International Society for Optical Engineering
4 国際会議録 Postmodification as a way to improve the lithographic performance of resist materials Li,W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Allen,R.D., Ito,H. SPIE-The International Society for Optical Engineering	10 国際会議録 High-resolution 248-nm bilayer resist Lin, Q., Petrillo, K. E., Babich, K., Tulipe, D. C. La, Medeiros, D., Mahorowala, A., Simons, J. P., Angelopoulos, M., … SPIE - The International Society of Optical Engineering
5 国際会議録 IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., … SPIE - The International Society of Optical Engineering	11 国際会議録 Rational design in cyclic olefin resists for sub-100-nm lithography Li, W., Varanasi, P.R., Lawson, M.C., Kwong, R.W., Chen, K.-J., Ito, H., Truong, H.D., Allen, R.D., Yamamoto, M., … SPIE-The International Society for Optical Engineering
6 国際会議録 Characterization of new aromatic polymers for 157-nm photoresist applications Fender,N., Brock,P.J., Chau,W., Bangsaruntip,S., Mahorowala,A.P., Wallraff,G.M., Hinsberg,W.D., Larson,C.E., Ito,H., … SPIE-The International Society for Optical Engineering	12 国際会議録 High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities Khojasteh, M., Chen, K.R., Kwong, R.W., Lawson, M.C., Varanasi, P.R., Patel, K.S., Kobayashi, E. SPIE-The International Society for Optical Engineering

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