Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance
- 著者名:
Patterson,K. ( Mortorola ) Sturtevant,J.L. Alvis,J.R. Benavides,N. Bonser,D. Cave,N. Nelson-Thomas,C. Taylor,W.D. Turnquest,K.L. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4344
- 発行年:
- 2001
- 開始ページ:
- 809
- 終了ページ:
- 814
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- 言語:
- 英語
- 請求記号:
- P63600/4344
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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American Institute of Chemical Engineers |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |