Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography
- 著者名:
- Postnikov,S.V. ( Motorola )
- Lucas,K.
- Wimmer,K.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4344
- 発行年:
- 2001
- 開始ページ:
- 797
- 終了ページ:
- 808
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- 言語:
- 英語
- 請求記号:
- P63600/4344
- 資料種別:
- 国際会議録
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Process, design and optical proximity correction requirements for the 65nm device generation
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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6
国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |