Monte Cario model of charging in resists in e-beam lithography

Monte Cario model of charging in resists in e-beam lithography

著者名:

Ko,Y.-Y. ( Univ. of Tennessee/Knoxville )
Joy,D.C.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4344

発行年:

2001

開始ページ:

544

終了ページ:

551

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

言語:

英語

請求記号:

P63600/4344

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012060
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2001 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.03.01

類似資料:

1 国際会議録 Monte Carlo model of charging in resists in e-beam lithography Ko,Y.-U., Hwu,J.J., joy,D.C. SPIE - The International Society for Optical Engineering	7 国際会議録 1999 ITRS metrology roadmap and its implications for lithography Diebold,A.C., Joy,D.C. SPIE - The International Society for Optical Engineering
2 国際会議録 Computer modeling of charging-induced electron beam deflection in electron beam lithography Hwu,J.J., Ko,Y.-U., Joy,D.C. SPIE - The International Society for Optical Engineering	8 国際会議録 Effects of low-voltage electron beam lithography [6151-85] Bolorizadeh M., Joy D. C. SPIE - The International Society of Optical Engineering
3 国際会議録 Simulation of imaging in projection microscope using multibeam probe Ko, Y.-U., Joy, D.C. SPIE-The International Society for Optical Engineering	9 国際会議録 Metrics of resolution and performance for CD-SEMs Joy,D.C., Ko,Y.-U., Hwu,J.J. SPIE - The International Society for Optical Engineering
4 国際会議録 Future of e-beam metrology: obstacles and opportunities (Keynote Paper) Joy, D.C. SPIE-The International Society for Optical Engineering	10 国際会議録 Ultralow-energy imaging for metrology Joy,D.C. SPIE-The International Society for Optical Engineering
5 国際会議録 Resist charging in electron-beam lithography Bai,M., Picard,D.S., Tanasa,C., McCord,M.A., Berglund,C.N., Pease,R.F.W SPIE - The International Society for Optical Engineering	11 国際会議録 Some issues in SEM-based metrology (Invited Paper) Joy,D.C. SPIE-The International Society for Optical Engineering
6 国際会議録 Simulation of repairing thin-film phase defect in masks for EUV lithography Ko, Y.-U., Joy, D.C., Hector, S.D., Lu, B. SPIE-The International Society for Optical Engineering	12 国際会議録 Low vacuum microscopy for mask metrology Joy, D.C. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12