Blank Cover Image

Method for prevention of unopened contact hole in dual-damascene process

著者名:
Lyu,G.-H. ( Samsung Electronics Co., Ltd. )
Kim,C.-H.
Lee,S.-J.
Yang,H.-H.
Lee,D.-Y.
Yoo,J.-Y.
Lee,J.-W.
Kim,Y.-H.
Nam,J.-L.
Han,W.-S.
さらに 5 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4344
発行年:
2001
開始ページ:
22
終了ページ:
31
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440303 [0819440302]
言語:
英語
請求記号:
P63600/4344
資料種別:
国際会議録

類似資料:

1 国際会議録 Control of resist flow process for sub-0.15-μm small contact hole by latent image

Kim,B.-K., Lee,S.-J., Lee,D.-Y., Lee,J.-W., Nam,J.-L.

SPIE-The International Society for Optical Engineering
7 国際会議録 Evaluation of litho printability of DRAM contact hole patterns with various programmed defects

K. Seo, S. Lee, H. Kim, D. Hwang, S. Kim, G. Jeong, O. Han, C. Chen, D. Yee, E. Kim, K. Park, N. Kim, S. Choi, D. Kim, …

SPIE - The International Society of Optical Engineering
2 国際会議録 Influence of intermetal dielectric thickness on overlay mark size variation in photolithography

Lee,S.-J., Yoo,J.-Y., Kim,Y.-C., Kim,H., Nam,J.-L., Chung,U.-I., Kang,G.-W., Han,W.-S.

SPIE - The International Society for Optical Engineering
8 国際会議録 A Study on the Microstructures and Electrical Properties of ZrO2 Thin Films

Nam, S.-W., Yoo, J.-H., Kim, H.-Y., Ko, D.-H., Yang, C.-W.

Electrochemical Society
3 国際会議録 Copper Diffusion and Corrosion Behavior Through the Hillock Defect Found Beneath the Weak SiN Dielectric Barrier in Dual Damascene Process

S. Kim, C. Shim, J. Hong, H. Lee, J. Han, K. Kim, Y. Kim

Electrochemical Society
9 国際会議録 Characterization of resist flow process for the improvement of contact hole CD uniformity

Koh, C.-W., Lee, D.-H., Kim, M.-S., Park, S.-N., Kwon, W.-T.

SPIE-The International Society for Optical Engineering
4 国際会議録 Optimization of align marks and overlay targets in VIA first dual damascene process

Shin, D.-U., Jeong, Y.-B., Park, J.-L., Choi, J.-S., Lee, J.-G., Lee, D.-H.

SPIE-The International Society for Optical Engineering
10 国際会議録 The study of contact hole MEEF and defect printability

Jeong, C.-Y., Lim, Y.H., Kim, H.I., Park, J.L., Choi, J.S., Lee, J.G.

SPIE - The International Society of Optical Engineering
5 国際会議録 New shrinkage technology for nano-contact hole formation

Oh, S. K., Kim, J. Y., Jung, Y. H., Lee, J. W., Kim, D. B., Kim, J., Lee, G. S., Lee, S. K., Ban, K. D., Jung, J. C., …

SPIE - The International Society of Optical Engineering
11 国際会議録 Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Kudo, T., Alemy, E.L., Dammel, R.R., Kim, W.-K., Lee, S.-H., Masuda, S., McKenzie, D.S., Rahman, M.D., Romano, A.R., …

SPIE-The International Society for Optical Engineering
6 国際会議録 Acoustic Mode Control Method Using Additional Cavity and Holes

Jeong,J.D., Yoo,S.W., Choi,H.G., Ahn,C.G., Lee,J.M.

Society for Experimental Mechanics
12 国際会議録 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12