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Combined metrology in cluding VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

著者名:
掲載資料名:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4343
発行年:
2001
開始ページ:
654
終了ページ:
664
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
言語:
英語
請求記号:
P63600/4343
資料種別:
国際会議録

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