Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography
- 著者名:
Vogt,U. ( Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy ) Stiel,H. Will,I. Wieland,M. Wilhein,T. Nickles,P.V. Sandner,W. - 掲載資料名:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4343
- 発行年:
- 2001
- 開始ページ:
- 535
- 終了ページ:
- 542
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- 言語:
- 英語
- 請求記号:
- P63600/4343
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
"Soft x-ray and EUV emission from cryogenic liquid jets irradiated with fs, ps, and ns laser pulses"
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |