Progress in placement control for ion beam stencil mask technology

Progress in placement control for ion beam stencil mask technology

著者名:

Kamm,F.-M. ( Infineon Technologies AG )

掲載資料名:

Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4343

発行年:

2001

開始ページ:

460

終了ページ:

465

総ページ数:

6

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440297 [0819440299]

言語:

英語

請求記号:

P63600/4343

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012059
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2001 : 5th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.01

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1 国際会議録 Progress in placement control for ion beam stencil mask technology Kamm,F.-M., Ehrmann,A., Struck,T., Kragler,K., Butschke,J., Letzkus,F., Springer,R., Haugeneder,E., Degen,A., Voigt,J., … SPIE-The International Society for Optical Engineering	7 国際会議録 Resist technologies for ion projection lithography(IPL)stencil maskmaking Irmscher,M., Butschke,J., Elian,K., Hoefflinger,B., Kragler,K., Letzkus,F., Ochsenhirt,J., Reuter,C., Springer,R. SPIE - The International Society for Optical Engineering
2 国際会議録 Stencil mask technology for ion beam lithography Ehrmann,A., Huber,S., Kasmaier,R., Oelmann,A.B., Struck,T., Springer,R., Butschke,J., Letzkus,F., Kragler,K., … SPIE - The International Society for Optical Engineering	8 国際会議録 Measures to achieve 20-nm IPL stenecil mask distortion Hougeneder, E., Chalupka A., Lammer, T., Loeschner, H., Kamm, F.-M., Struck, T., Ehrmann, A., Kaesmaier, R., Wolter, A., … SPIE-The International Society for Optical Engineering
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4 国際会議録 Stencil mask key parameter measurement and control Ehrmann,A., Elsner,A., Liebe,R., Struck,T., Butschke,J., Letzkus,F., Irmscher,M., Springer,R., Haugeneder,E., … SPIE - The International Society for Optical Engineering	10 国際会議録 CD measurements of IPL stencil masks with optical microscopes Bentfeldt,A., Ehrmann,A., Schatz,T., Struck,T. SPIE - The International Society for Optical Engineering
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