Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme-ultraviolet wavelengths
- 著者名:
Shumway,M.D. ( Univ. of California/Berkeley ) Lee,S.H. Cho,C.H. Naulleau,P. Goldberg,K.A. Bokor,J. - 掲載資料名:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4343
- 発行年:
- 2001
- 開始ページ:
- 357
- 終了ページ:
- 362
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- 言語:
- 英語
- 請求記号:
- P63600/4343
- 資料種別:
- 国際会議録
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3
国際会議録
Resist evauation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |