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Development of a high-average-power extreme-ultraviolet electric capillary discharge source

著者名:
Fornaciari,N.R. ( Sandia National Labs. )
Bender,H.
Buchenauer,D.
Kanouff,M.P.
Karim,S.
Kubiak,G.D.
Moen,C.D.
Shimkaveg,G.M.
Silfvast,W.T.
Stewart,K.D.
さらに 5 件
掲載資料名:
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4343
発行年:
2001
開始ページ:
226
終了ページ:
231
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440297 [0819440299]
言語:
英語
請求記号:
P63600/4343
資料種別:
国際会議録

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