Room-temperature spectral hole burning of Eu3+-doped Al2O3-SiO2 glasses treated with H2 gas and x ray

Room-temperature spectral hole burning of Eu3+-doped Al2O3-SiO2 glasses treated with H2 gas and x ray

著者名:

Ishikawa,T. ( Nagoya Institute of Technology )
Hayakawa,T.
Nogami,M.

掲載資料名:

Rare-Earth-Doped Materials and Devices V

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4282

発行年:

2001

開始ページ:

50

終了ページ:

56

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819439604 [0819439606]

言語:

英語

請求記号:

P63600/4282

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011998
シリーズID:	PA00000029
会議名:	Photonics West - Optoelectronic Materials and Devices : Rare-earth-doped materials and devices
回次:	2001 : 5th
会議開催地:	San Jose, CA, USA
会議開催年:	2001.01.22-2001.01.23

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