Simulation of picosecond pulsed laser ablation of silicon: the molecular-dynamics thermal-annealing model

Simulation of picosecond pulsed laser ablation of silicon: the molecular-dynamics thermal-annealing model

著者名:

Lorazo,P. ( Ecole Polytechnique de Montreal )
Lewis,L.J.
Meunier,M.

掲載資料名:

Commercial and biomedical applications of ultrashort pulse lasers; laser plasma generation and diagnostics : 23 January, 2001, San Jose, [California] USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4276

発行年:

2001

開始ページ:

57

終了ページ:

61

総ページ数:

5

出版情報:

Bellingham, Washington: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819439543 [0819439541]

言語:

英語

請求記号:

P63600/4276

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011992
シリーズID:	PA00000029
会議名:	SPIE LASE : Commercial and biomedical applications of ultrashort pulse lasers
回次:	2001
会議開催地:	San Jose, CA, USA
会議開催年:	2001.01.23

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