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Optimization of the planarizing performance of a DUV organic bottom antireflective coating for via first dual-damascene process: cooperation to achieve material and process characterization

著者名:
Williams,P.
Martin,A.
Strobl,M.
Roberts,W.R.
Goodwin,F.G.
Volkel,L.
Feicke,A.
Trautman,S.
Lamb Ⅲ,J.E.
さらに 4 件
掲載資料名:
Microlithographic Techniques in Integrated Circuit Fabrication II
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4226
発行年:
2000
開始ページ:
160
終了ページ:
168
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438980 [0819438987]
言語:
英語
請求記号:
P63600/4226
資料種別:
国際会議録

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