Dense plasma focus radiation source for microlithography and micromachining

Dense plasma focus radiation source for microlithography and micromachining

著者名:

掲載資料名:

Microlithographic Techniques in Integrated Circuit Fabrication II

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4226

発行年:

2000

開始ページ:

151

終了ページ:

159

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438980 [0819438987]

言語:

英語

請求記号:

P63600/4226

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011945
シリーズID:	PA00000029
会議名:	Microlithographic techniques in integrated circuit fabrication
回次:	2000 : 2nd
会議開催地:	Singapore
会議開催年:	2000.11.28-2000.11.30

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