Low-k1 imaging: how low can we go?

Low-k1 imaging: how low can we go?

著者名:

掲載資料名:

Microlithographic Techniques in Integrated Circuit Fabrication II

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4226

発行年:

2000

開始ページ:

1

終了ページ:

15

総ページ数:

15

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438980 [0819438987]

言語:

英語

請求記号:

P63600/4226

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011945
シリーズID:	PA00000029
会議名:	Microlithographic techniques in integrated circuit fabrication
回次:	2000 : 2nd
会議開催地:	Singapore
会議開催年:	2000.11.28-2000.11.30

類似資料:

1 国際会議録 The flash memory battle: How low can we go? E. van Setten, O. Wismans, K. Grim, J. Finders, M. Dusa Society of Photo-optical Instrumentation Engineers	7 国際会議録 Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18] Janssen, M., van Ingen Schenau, K., van der Laan, H. SPIE - The International Society of Optical Engineering
2 国際会議録 Mask error factor:causes and implications for process latitude Schoot,J.van, Finders,J., Schenau,K.van Ingen, Klaassen,M., Buijk,C. SPIE - The International Society for Optical Engineering	8 国際会議録 Templated Synthesis of Enzyme Mimics: How Far Can We Go? Anderson S., Sanders M. K. J. Kluwer Academic Publishers
3 国際会議録 The lithography technology for the 32 nm HP and beyond M. Dusa, B. Arnold, J. Finders, H. Meiling, K. van Ingen Schenau Society of Photo-optical Instrumentation Engineers	9 国際会議録 Progress toward developing high performance immersion compatible materials and processes Claypool, J. B., Weimer, M., Krishnamurthy, V., Gehoel, W., Schenau, K. van Ingen SPIE - The International Society of Optical Engineering
4 国際会議録 0.11-μm imaging in KrF lithography using dipole illumination Eurlings,M., Setten,E.van, Torres,J.A., Dusa,M.V., Socha,R.J., Capodieci,L., Finders,J. SPIE-The International Society for Optical Engineering	10 国際会議録 Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond Hsu, S.D., Corcoran, N.P., Eurlings, M., Knose, W.T., Laidig, T.L., Wampler, K.E., Roy, S., Shi, X., Hsu, C.M., Chen, … SPIE-The International Society for Optical Engineering
5 国際会議録 System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems van Ingen Schenau, K., Bakker, H., Zellenrath, M., Moerman, R., Linders, J., Rohe, T., Emer, W. SPIE-The International Society for Optical Engineering	11 国際会議録 Pitch doubling through dual-patterning lithography challenges in integration and litho budgets M. Dusa, J. Quaedackers, O. F. A. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van I. … SPIE - The International Society of Optical Engineering
6 国際会議録 Process optimization for sub-100-nm gate patterns using phase edge lithography Schenau,K.van Ingen, Vleeming,B., Ansem,W.F.Gehoel-van, Wong,P., Vandenberghe,G.N. SPIE-The International Society for Optical Engineering	12 国際会議録 Lithographic performance of recent DUV photoresists Streefkerk,B., van,Ingen,Schenau,K., Buijk,C. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12