Oxygen Precipitation Behavior and its Optimum Condition for Internal Gettering and Mechanical Strength in Epitaxial and Polished Silicon Wafers
- 著者名:
Sueoka,K. Akatsuka,M. Onno,T. Asayama,E. Koike,Y. Adachi,N. Sadamitsu,S. Katahama,H. - 掲載資料名:
- High Purity Silicon VI : proceedings of the sixth International Symposium
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4218
- 発行年:
- 2000
- 開始ページ:
- 164
- 終了ページ:
- 179
- 総ページ数:
- 16
- 出版情報:
- Pennington, N.J. — Bellingham, Wash.: Electrochemical Society — SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9781566772846 [1566772842]
- 言語:
- 英語
- 請求記号:
- P63600/4218
- 資料種別:
- 国際会議録
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