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Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process

著者名:
Palmer,S.R.
Mason,M.E.
Randall,J.N.
Aton,T.
Kim,K.
Tritchkov,A.V.
Burdorf,J.
Rieger,M.L.
Stirniman,J.P.
さらに 4 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
921
終了ページ:
932
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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