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Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction

著者名:
Nam,B.H.
Kim,D.S.
Cho,B.H.
Seok,N.K.
Jeong,J.K.
Kim,S.P.
Kang,S.W.
Hwang,Y.J.
Song,Y.J.
さらに 4 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
793
終了ページ:
800
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

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