Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication

著者名:

Magg,C.

掲載資料名:

20th Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4186

発行年:

2000

開始ページ:

707

終了ページ:

716

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438492 [0819438499]

言語:

英語

請求記号:

P63600/4186

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011906
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2000 : 20th
会議開催地:	Monterey, CA, USA
会議開催年:	2000.09.13-2000.09.15

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