Blank Cover Image

Emergence of assist feature OPC era in sub-130-nm DRAM devices

著者名:
Kim,B.
Kim,I.
Yeo,G.
Lee,J.
Choi,J.
Cho,H.
Moon,J.
さらに 2 件
掲載資料名:
20th Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4186
発行年:
2000
開始ページ:
452
終了ページ:
459
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
言語:
英語
請求記号:
P63600/4186
資料種別:
国際会議録

類似資料:

1 国際会議録 One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application

Kang,H.-J., Kim,B.-S., Park,J.-S., Kim,I.-S., Yeo,G.-S., Lee,J.-H., Cho,H.-K., Moon,J.-T.

SPIE-The International Society for Optical Engineering
7 国際会議録 Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., …

SPIE - The International Society of Optical Engineering
2 国際会議録 A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices

D. Park, S. Kim, C. Hwang, S. Lee, H. Cho, J. Moon

SPIE - The International Society of Optical Engineering
8 国際会議録 ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
3 国際会議録 Phase-shifted assist feature OPC for sub-45-nm node optical lithography

G. Yoon, H. Kim, J. Lee, S. Choi, W. Han

SPIE - The International Society of Optical Engineering
9 国際会議録 PSM defect printability of extremely low-k1 sub-130-nm KrF lithography

Cho, W.-I., Yeo, G., Moon, S.-Y., Yoon, H.-S., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
4 国際会議録 Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
10 国際会議録 A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Lee, S., Hwang, C., Park, D.-W., Kim, I.-S., Kim, H.-C., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
5 国際会議録 Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32]

Jung, S., Kim, I.-S., Kang, Y.-S., Yeo, G.-S., Woo, S.-G., Cho. H., Moon, K.-T.

SPIE - The International Society of Optical Engineering
11 国際会議録 Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H., Kim, H.-D., Chung, D.-H., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
6 国際会議録 Lithography process design for 4-Gb DRAM of 0.31 k1 with KrF

Park,J., Yeo,G., Kim,I., Kim,B.-S., Lee,J., Cho,H., Moon,J.T.

SPIE-The International Society for Optical Engineering
12 国際会議録 Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Kim, S.-H., Lee, S.-H., Yeo, G.-S., Lee, J.H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12