Correlation between the reliability of ultrathin ISSG SiO2 and hydrogen content

Correlation between the reliability of ultrathin ISSG SiO2 and hydrogen content

著者名:

Luo,T.Y.

掲載資料名:

Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4181

発行年:

2000

開始ページ:

220

終了ページ:

231

総ページ数:

12

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819438423 [0819438421]

言語:

英語

請求記号:

P63600/4181

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00011900
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Challenges in process integration and device technology
回次:	2000
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.09.18-2000.09.19

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