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Effect of stress and dopant redistribution on trench-isolated narrow devices

著者名:
掲載資料名:
Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4181
発行年:
2000
開始ページ:
183
終了ページ:
190
総ページ数:
8
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438423 [0819438421]
言語:
英語
請求記号:
P63600/4181
資料種別:
国際会議録

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