Feasibility of very low k1(=0.31) KrF lithography
- 著者名:
- 掲載資料名:
- Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4181
- 発行年:
- 2000
- 開始ページ:
- 17
- 終了ページ:
- 24
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819438423 [0819438421]
- 言語:
- 英語
- 請求記号:
- P63600/4181
- 資料種別:
- 国際会議録
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