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In-situ annealing during the growth of relaxed SiGe

著者名:
Li,D.
Huang,C.
Cheng,B.
Wang,H.
Yu,Z.
Zhang,C.
Yu,J.
Wang,Q.
さらに 3 件
掲載資料名:
Optical and infrared thin films : 1 August 2000, San Diego, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4094
発行年:
2000
開始ページ:
93
終了ページ:
99
総ページ数:
7
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437396 [0819437395]
言語:
英語
請求記号:
P63600/4094
資料種別:
国際会議録

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